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Vertical Plasma Etching and Cleaning Equipment

It can perform processes such as removal of residue in holes, surface cleaning, roughening, and activation

Introductions

Application Areas

PI Surface Roughening and Cleaning

PCB Desmear and Surface Cleaning

FPC Desmear and Surface Cleaning

Surface Roughening and Cleaning of Electronic Materials

Surface Roughening and Cleaning of COVERLY

Product Features

Special Gas Inlet, Diffusion, and Exhaust System Design

Provides excellent processing uniformity and consistent results

Supports various gases

Fully automatic, simple and easy to operate, with high stability and easy maintenance

Special specification machine can be customized according to customer's requirements

Specification

Machine Dimensions (LWH)

3058*4340*2409mm

Vacuum

≤1pa( At standard atmospheric pressure)

Processing thickness range

0.1-10.0mm

Processable size

Max: 48" × 29" (1220 mm × 736 mm) Min: 4" × 4" (100 mm × 100 mm)

Max. layers

15 layers  (13/18/20 layers customizable)

 Gas direction

Top to bottom

Types of gas

N2、O2、CF4、H2

 Output frequency

40KHz

Output power

10Kw

Uniformity

≥80%

Noise

 (Normal operation):≤70dB

 Control panel

Mouse, keyboard & touchscreen operation

Protection device

Emergency stop device

Loading method

Manual loading + material cart transport

Failure rate

≤1/400h(failure time / equipment operating time)

Console height

900±100mm

Production Requirements

① Pretreatment of incoming materials

② Set pre-baking temperature and time based on the Tg value of the board

Communal Requirement

Electrical requirements

Electric

Three-phase five-wire 380V

 Pressure of compressed air

≧ 6.5bar

Power (output)

30KW

With pump station exhaust port

KF40

Compressed air consumption

6m³/h(interfaces:φ12mm)

Recommended space 

around machine

800mm

Weight of machine

3200KG

 Ice-wate

35 L/min at 20°C (water pressure: 4 kg)

 Equipment installation environment (temperature, humidity, and cleanliness requirements)

A. Environmental requirements: clean room, 100,000 level ↑ .

B. Temperature requirement: 22±2℃ .

C. Humidity requirements: 50±5%

Process gas

Purity: 99.999%


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